The use of thin films is continuously expanding. In the family of Physical Vapour Deposition techniques, sputtering is one of the most important over the past 40 years. In this book, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are describedin detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to start with reactive magnetron sputtering, understand and investigate the technique, control their sputtering process and tune their existing process, obtaining the desired thin films. Covers all the sputtering techniques for thin-film deposition. Describes the physical basics and related technical realization. Gives advice on controlling the sputter process and quality of the layers produced. Valuable reference work for researchers as well as study text for graduate students INDICE: 1. Computer Simulations on Sputtering. 2. Electron Emission from Surfaces Induced by Slow Ions and Atoms. 3. Modeling of the Magnetron Discharge. 4. Modeling of Reactive Sputtering Process. 5. Depositing Aluminium Oxide: ACase Study of Reactive Magnetron Sputtering. 6. Transport a Sputtered Particles through the Gas Phase. 7. Energy Deposition at the Substrate in a MagnetronSputtering System. 8. Process Diagnostics. 9. Optical Plasma Diagnostics during Reactive Magnetron Sputtering. 10. Reactive Magnetron Sputtering of Indium Tin Oxide Thin Films: The Cross Corner and Cross Magnetron Effect. 11. Reactively Sputter-deposited Solid Electrolytes and Their Applications. 12. Reactive-Sputtered Wide-Bandgap p-Type Semiconducting Spinel AB2O4 and Delafossite ABO2Thin Films for ‘Transparent Electronics’. 13. Oxide-based Electrochromic Materials and Devices Prepared by Magnetron Sputtering. 14. Atomic Assembly of Magnetoresistive Multilayers.
- ISBN: 978-3-540-76662-9
- Editorial: Springer
- Encuadernacion: Cartoné
- Páginas: 470
- Fecha Publicación: 01/02/2008
- Nº Volúmenes: 1
- Idioma: Inglés