The first edition published in 2004 and has proved to be both a valuable textbook and a handy desk reference. It filled a gap in the market by providing students with an accessible guide to an important field, but now is the time forit to be updated. This edition has 5 new chapters to incorporate the recent developments in the field. CMOS-MEMS integration, Moores law and scaling trendssections have been updated with the latest in CMOS generation findings. Surface micromachining has been given a whole chapter, as have the topics of polymer microprocessing and glass microprocessing. Many areas have been expanded upon with more varied examples given. In the beginning chapters, there are variedMEMS and optofluidics examples. Chapter 5 now includes step coverage and stresses and simple descriptions of major techniques: evaporation, sputtering, CVD, spin coating, and plating. Chapter 7 has more examples of Micro-optics, TFH,PV, GMR, MEMS, doped films, PSG, ITO, and silicides. Within Chapter 8 the section on pattern generation has been built on considerably, with more material on electron beam lithography, self-organised patterns and special techniques. Photoresist basics can now be found in Chapter 9, and reduction steppers and scanners in Chapter 10. Chapter 12 on wafer cleaning contains more information about wetting, adsorption and hydrophobicity. 40% of the original book has been restructured to make clearer which sections cover the basic principles and which contain more advanced material. Sections on wet etched structures, DRIE, silicon wafer engineering, special processes, and serial microprocessing have be dismantled from old chapters and considerably expand on. The benchmark title in this field, Madou/Introduction to Microfabrication, is lengthy, expensiveand impractical as a textbook.
- ISBN: 978-0-470-74983-8
- Editorial: John Wiley & Sons
- Encuadernacion: Cartoné
- Páginas: 584
- Fecha Publicación: 24/09/2010
- Nº Volúmenes: 1
- Idioma: Inglés