Low pressure plasmas and microstructuring technology

Low pressure plasmas and microstructuring technology

Franz, G.

155,95 €(IVA inc.)

This monograph presents an up to date perspective of gas discharge physics and its applications to various industries. It starts from an overview of the different types of plasmas: DC-discharging, capacitive and inductive radiofrequency coupling, helicon waves, and of course ion beams. Next, much effort was invested on an appropriate description of plasma diagnostics which is presented on the basis of four important examples. It follows a comprehensive presentation the modern sputter- and etching processes which are inevitable for industrial coating a structuring. One particular emphasis is put on reactive processesand the corresponding microscopic mechanisms. The book is rich of examples which demonstrate that structuring processes with low pressure plasmas is a highpotential technology due to its easy and convenient implantation as well as its favourable environmental impact. Plasma technologies are inevitable for themicroelectronic research and industry – this book explains how! First Englishedition of the successful, corresponding German book

  • ISBN: 978-3-540-85848-5
  • Editorial: Springer
  • Encuadernacion: Cartoné
  • Páginas: 550
  • Fecha Publicación: 01/10/2008
  • Nº Volúmenes: 1
  • Idioma: Inglés