Surface and thin film analysis: a compendium of principles, instrumentation, and applications

Surveying and comparing all techniques relevant for practical applications, this second edition of a bestseller is a vital guide to this hot topic in nano-and surface technology. Completely revised and updated, sections include electron, ion and photon detection, as well as scanning microscopy, while new chapters have been added to cover such recently developed techniques as SNOM, SERS, and laser ablation. Over 500 references and a list of equipment suppliers make this a rapid reference for materials scientists, analytical chemists, and those working in the biotechnological industry. INDICE: INTRODUCTION ELECTRON DETECTION Photoelectron Spectroscopy (XPS, UPS) Auger Electron Spectroscopy (AES, SAM) Electron Energy Loss Spectroscopy (EELS) Low-energy Electron Diffraction (LEED) ION DETECTION Static Secondary Ion Mass Spectrometry (SSIMS) Dynamic Secondary Ion Mass Spectrometry (SIMS) Electron Beam and HF-Plasma Secondary Neutral Mass Spectrometry (SNMS) Laser-SNMSRutherford Backscattering Spectroscopy (RBS) Low Energy Ion Scattering (LEIS)Nuclear Reaction Analysis (NRA) PHOTON DETECTION Total Reflection X-Ray Fluorescence Analysis (TXRF) Energy-dispersive X-ray Spectroscopy (EDXS) Grazing Incidence X-Ray Methods for Near-surface Structural Studies Glow Discharge Optical Emission Spectroscopy (GD-OES) Surface Analysis by Laser Ablation Ion Beam Spectrochemical Analysis (IBSCA) Reflection Absorption IR Spectroscopy (RAIRS)Surface-enhanced Raman Scattering (SERS) UV/VIS/IR Ellipsometry (ELL) SCANNING MICROSCOPY Atomic Force Microscopy (AFM) Scanning Tunneling Microscopy (STM)MISCELLANEOUS LEEM TXRF-NEXAFS GIXRF-NEXAFS SNOM EF-TEM SFG SHG FIM/AP SUMMARY AND COMPARISON OF TECHNIQUES SURFACE ANALYTICAL EQUIPMENT SUPPLIERS REFERENCES

• ISBN: 978-3-527-32047-9
• Editorial: Wiley-VCH
• Encuadernacion: Cartoné
• Páginas: 544
• Fecha Publicación: 20/04/2011
• Nº Volúmenes: 1
• Idioma: Inglés