High-resolution x-ray scattering: from thin films to lateral nanostructures

The book presents a detailed description of high-resolution x-ray scattering methods suitable for the investigation of the real structure of single-crystalline layers and multilayers, including structure defects in the layers and at the interfaces. Particular attention is devoted to lateral structures in semiconductors and semiconductor multilayers such as quantum wires and quantum dots. Both the theoretical background and the application of the methods are discussed. The second edition is extended to deal with lateral surface nanostructures such as gratings and dots, new examples for measuring layer thickness, lattice mismatch, and surface/interface roughness. The book will be an invaluable source for graduates and scientists. . INDICE: Part I. Experimental Realization: Elements for Designing an X-Ray Diffraction Experiment; Diffractometers and Reflectometers; Scans and Resolution in Angular and Reciprocal Space.- Part II. Basic Principles: Basic Principles; Kinematic Theory; Dynamical Theory; Semikinematic Theory.- Part III. Determination of Layer Thicknesses of Single Layers and Multilayers: Lattice Parameters and Lattice Strains in Single Epitaxial Layers and Multilayers; Diffuse Scattering from Volume Defects in Thin Layers; X-Ray Scattering by Rough Multilayers.- Part IV. X-Ray Scattering by Laterally Constructed Semiconductor Nanostructures: X-Ray Scattering by Artificially Lateral Semiconductor Nanostructures; Strain Analysis in Periodic Nanostructures; X-Ray Scattering from Self-Organized Structures.- References.- Index.

• ISBN: 978-1-4419-2307-3
• Editorial: Springer
• Encuadernacion: Rústica
• Fecha Publicación: 31/03/2012
• Nº Volúmenes: 1
• Idioma: Inglés