Materials and Processes for Next Generation Lithography

These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various communities to produce in one place a definitive description of the many approaches to lithography fabrication. Assembles up-to-date information from the world's premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigationIncludes information on processing and metrology techniquesBrings together multiple approaches to litho pattern recording from academia and industry in one place INDICE: 1. Overview Richard Lawson and Alex Phillip Graham Robinson 2. Theory: EUV Induced Chemistry Seiichi Tagawa 3. Theory: Electron Induced Chemistry Willem Frederik van Dorp 4. Material Challenges for NGL Resists Clifford Henderson 5. Litho Process Challenges (TBC) Yasin Ekinci and Patrick Naulleau 6. Non-CAR approaches (covering EUV, EBL, 193) Andrew Whittaker 7. NGL CARs (Overview, acid amplifer, polymer bound pag) Jim Thackeray 8. Negative Tone Molecular Richard Lawson and Alex Phillip Graham Robinson 9. Positive Tone Molecular Panagiotis Argitis 10. Inorganic - HSQ Deidre Olynick 11. Inorganic Hafinum 12. Other Resist Design Concepts Alex Phillip, Graham Robinson, Scott Lewis, Deidre Olynick, Brian Cardineau 13. Imprint Lithography S. Sreenivasan 14. Scanning Probe Marcus Kästner, Ivo Rangelow and Philip C. Paul 15. Scanning Helium Ion Beam Lithography Stuart Boden and Xiaoqing Sally Shi

• ISBN: 978-0-08-100354-1
• Editorial: Elsevier
• Encuadernacion: Cartoné
• Páginas: 425
• Fecha Publicación: 01/09/2016
• Nº Volúmenes: 1
• Idioma: Inglés